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June 1, 2012
DAC 2012: 20(nm) questions
There's still debate over certain aspects of the 20nm node, but the main challenges are already being addressed. Expect to see foundries and vendors mark their turf at DAC.
Expert Insight | Topics:
EDA - DFM
| Tags:
20nm
,
DAC 2012
,
double patterning
,
dummy fill
,
foundry
,
parasitic extraction
| Organizations:
Mentor Graphics
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DFM
DFT
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