layout dependent effect (LDE)

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May 19, 2014

14nm/16nm processes

The 14nm and 16nm processes cover a range of technologies and are designed to succeed the 20nm generation. They bring with them a number of design challenges.

Guide | Topics: EDA - IC Implementation | Tags: 14nm/16nm, cell pin access, double patterning, interconnect resistance, layout dependent effect (LDE)