Eldo

October 2, 2013

Catching layout-dependent effects on-the-fly

New layout-dependent effects (LDEs) arise at each process node. This methodology updates LDE parameters and uses on-the-fly simulation for early detection.
Article  |  Topics: EDA - DFM, IC Implementation  |  Tags: , , , ,   |  Organizations:

PLATINUM SPONSORS

Synopsys Cadence Design Systems Siemens EDA
View All Sponsors