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March 1, 2021
Machine learning overcomes library challenges at the latest process nodes
From 16nm, new complexities hinder .lib file characterization and verification but machine learning now offers an efficient way of managing them.
Article | Topics:
EDA - Verification
| Tags:
.lib
,
16nm and below
,
characterization
,
corner
,
IP
,
Liberty Variation Format
,
library
,
machine learning
,
OCV
,
PVT
,
Solido
| Organizations:
Siemens EDA
EDA Topics
DFM
DFT
ESL
IC Implementation
Verification
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