March 2009

March 1, 2009

Chemical mechanical polish: the enabling technology

Chemical mechanical polishing (CMP) has traditionally been considered an enabling technology. It was first used in the early 1990s for BEOL metallization to replanarize the wafer substrate thus enabling advanced lithography, which was becoming ever more sensitive to wafer surface topography. Subsequent uses of CMP included density scaling via shallow trench isolation and interconnect formation […]

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