Using multi-corner multi-mode techniques to meet the P&R challenges at 65 nm and below
Concurrent multi-corner, multi-mode analysis and optimization is becoming increasingly necessary for sub-65nm designs. Traditional P&R tools force the designers to pick one or two mode corner scenarios due to inherent architectural limitations. As an example of the problem, a cellphone chip typically needs to be designed for 20 mode/corners scenarios. In the absence of a […]
