Infineon Technologies

August 23, 2011

Quantifying returns on litho-friendly design

By the time a serious lithography-related problem is identified at the fab, it is too late in the design process to make simple layout changes. To avoid or reduce design delays, Infineon Technologies uses lithography simulation to detect weak points in a layout and analyze the effect of lithography on the design’s electrical performance. Its [...]
Article  |  Topics: EDA - DFM  |  Tags: , , ,   |  Organizations:

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