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Hitachi
Hitachi
March 26, 2015
A review of model development for 10nm lithography
John Sturtevant looks at ongoing preparations for the incoming node and charts significant progress that has already been made.
Article | Topics:
EDA - DFM
| Tags:
10nm
,
lithography
,
models
| Organizations:
Applied Materials
,
Hitachi
,
Mentor Graphics
EDA Topics
DFM
DFT
ESL
IC Implementation
Verification
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