DFM

September 10, 2014

If we’d only known then what we know now

Innovation in physical verification is driven by incoming nodes but new tools and features can and should be fed back up the technology chain.
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August 12, 2014
Joe Kwan is the Product Marketing Manager for Calibre LFD and Calibre DFM Services at Mentor Graphics.

Sign-off lithography simulation and multi-patterning must play well together

Sign-off lithography verification is vital as we move beyond double to multi-patterning but changing responsibilities in the flow must be handed with care.
July 9, 2014
Intel's trigate is among the structures to be modeled by the revised BSIM4

One BSIM to rule them all

A change in the way the core compact models are developed has accelerated their development and, for the first time, allowed the models to be used not just for circuit simulation but to help guide process evolution as chipmakers play not only with materials but the shape of finFETs.
June 30, 2014
Future of thermal simulation

The future of thermal simulation for electronics products

Complexity and the increasing use of thermal analysis software by non-expert designers demands new approaches for chip and PCB implementations.
June 18, 2014
Parasitic Extraction Featured Image

Full 3D-IC parasitic extraction

How to enhance an 'ideal' parastitic extraction strategy to create a full 3D assembly-level parasitic netlist for simulation and circuit analysis.
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May 30, 2014

How the right DFY flow enhances performance and profit

'Design for yield' is a familiar term, but the challenges in today's increasingly large projects make a refresher on what it offers particularly timely.
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April 28, 2014

Protecting IP in a collaborative signoff environment

The encryption chain for today's highly collaborative designs needs to be managed with care.
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April 3, 2014
Joe Kwan is the Product Marketing Manager for Calibre LFD and Calibre DFM Services at Mentor Graphics.

Standard cell IP must pass the litho-friendly routing test

Lithography is only just beginning to play a role in cell IP selection but early analysis already matters.
January 20, 2014
Jean-Marie Brunet is the Product Marketing Director for DFM at Mentor Graphics

Patterning choices loom for 10nm and beyond

It is not just a choice between EUV and multiple patterning for future nodes, but even between varieties of multi-mask technologies. How will you decide?
January 13, 2014
Steffen Schulze is director of marketing for Calibre Mask Data Preparation at Mentor Graphics

Consider your options for future nodes

If EUV is further delayed until 8nm, the industry has to explore other options for patterning, and the effects they will have on the DFM flow.

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