Blog Topics

July 9, 2015

IBM and friends at 7nm: breakthrough or science project?

IBM, GlobalFoundries, Samsung and SUNY deserve kudos for manufacturing the first 7nm chip but the NREs involved still look frightening.
July 8, 2015

Remembering Gary Smith

The leading EDA analyst passed away late last week after a short illness. Graham Bell offers this remembrance.
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June 30, 2015

Chipmakers see 3x test-pattern saving in embedded-test logic

Companies such as Broadcom are experiencing threefold test-pattern reductions through the use of automatically inserted gates that allow parallel cones to share the same ATPG patterns that would not be possible using conventional test generation schemes.
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June 29, 2015

FastSpice update improves parallelism and adds wreal support

The latest update to the CustomSim FastSpice tool from Synopsys provides more consistent speedups from multicore workstations and adds support for BCD processes and real-number modeling.
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June 26, 2015

‘This sensor will self-destruct in the next five (hundred thousand) seconds’

Research by Professor John Rogers' group at the University of Illinois is leading to biodegradable electronics, for both defense and medical applications.
June 25, 2015

X-Fab updates 180nm SOI process for automotive and industrial applications

Foundry claims isolation and device integration advantages for 180nm SOI process, help to absorb extra costs of SOI wafers
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June 24, 2015

Mediatek extends big.LITTLE strategy with ‘tri-cluster’ smartphone CPU

Ten cores in three clusters help match smartphone power/performance to app load and usage at MediaTek, thanks to Synopsys design exploration tools
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June 23, 2015

Sonics updates tune memory and link width for speed and power

The latest release of the SonicsGN NoC infrastructure provides speedups for multichannel memories.
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June 19, 2015

Tanner integration to assist Mentor in IoT and photonics

Following Mentor's acquisition of Tanner EDA, management expect the integration will help with a drive into IoT applications and systems that need to go beyond standard IC lithography.
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June 18, 2015

The road to 7nm sees patterning multiply

Is the industry ready to go beyond 10nm when it comes to lithography? Lithography researcher Professor David Pan sees design and process co-operation as the key approach.

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