EDA

July 28, 2015

Samsung applies early prediction and color management to 10nm plans

Rapid virtual prototyping and a metal stack that's more designer friendly are two of the ways in which Samsung aims to build up foundry market share for its 14nm and 10nm finFET processes.
July 13, 2015

GlobalFoundries tunes 28nm for smaller, lower-power FD-SOI

GlobalFoundries has developed variants of the 28nm FD-SOI process that offer smaller die sizes and lower-power operation.
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July 9, 2015

IBM and friends at 7nm: breakthrough or science project?

IBM, GlobalFoundries, Samsung and SUNY deserve kudos for manufacturing the first 7nm chip but the NREs involved still look frightening.
July 8, 2015

Remembering Gary Smith

The leading EDA analyst passed away late last week after a short illness. Graham Bell offers this remembrance.
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June 30, 2015

Chipmakers see 3x test-pattern saving in embedded-test logic

Companies such as Broadcom are experiencing threefold test-pattern reductions through the use of automatically inserted gates that allow parallel cones to share the same ATPG patterns that would not be possible using conventional test generation schemes.
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June 29, 2015

FastSpice update improves parallelism and adds wreal support

The latest update to the CustomSim FastSpice tool from Synopsys provides more consistent speedups from multicore workstations and adds support for BCD processes and real-number modeling.
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June 25, 2015

X-Fab updates 180nm SOI process for automotive and industrial applications

Foundry claims isolation and device integration advantages for 180nm SOI process, help to absorb extra costs of SOI wafers
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June 23, 2015

Sonics updates tune memory and link width for speed and power

The latest release of the SonicsGN NoC infrastructure provides speedups for multichannel memories.
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June 19, 2015

Tanner integration to assist Mentor in IoT and photonics

Following Mentor's acquisition of Tanner EDA, management expect the integration will help with a drive into IoT applications and systems that need to go beyond standard IC lithography.
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June 18, 2015

The road to 7nm sees patterning multiply

Is the industry ready to go beyond 10nm when it comes to lithography? Lithography researcher Professor David Pan sees design and process co-operation as the key approach.

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