DFM

November 5, 2014
Pattern matching DRC featured image

How to use pattern matching to improve automatic waiver management

Fab and IP vendor collaboration is making pattern matching-based libraries a vital component of DRC accuracy and efficiency. Learn how to take advantage.
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September 10, 2014
John Ferguson is the director of marketing for Calibre DRC applications at Mentor Graphics. John has worked extensively in the area of physical design verification for the manufacture of leading edge integrated circuits.

If we’d only known then what we know now

Innovation in physical verification is driven by incoming nodes but new tools and features can and should be fed back up the technology chain.
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August 12, 2014
Joe Kwan is the Product Marketing Manager for Calibre LFD and Calibre DFM Services at Mentor Graphics.

Sign-off lithography simulation and multi-patterning must play well together

Sign-off lithography verification is vital as we move beyond double to multi-patterning but changing responsibilities in the flow must be handed with care.
July 9, 2014
Intel's trigate is among the structures to be modeled by the revised BSIM4

One BSIM to rule them all

A change in the way the core compact models are developed has accelerated their development and, for the first time, allowed the models to be used not just for circuit simulation but to help guide process evolution as chipmakers play not only with materials but the shape of finFETs.
June 30, 2014
Future of thermal simulation

The future of thermal simulation for electronics products

Complexity and the increasing use of thermal analysis software by non-expert designers demands new approaches for chip and PCB implementations.
June 18, 2014
Parasitic Extraction Featured Image

Full 3D-IC parasitic extraction

How to enhance an 'ideal' parastitic extraction strategy to create a full 3D assembly-level parasitic netlist for simulation and circuit analysis.
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May 30, 2014
propfeatim

How the right DFY flow enhances performance and profit

'Design for yield' is a familiar term, but the challenges in today's increasingly large projects make a refresher on what it offers particularly timely.
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May 26, 2014
Unidirectionally routed M1 using SADP (Source: CMU/IBM)

Triple patterning and self-aligned double patterning (SADP)

In the absence of EUV lithography, the primary option for manufacturing on a 10nm process is to extend double patterning. But the options each have issues.
April 28, 2014
John Ferguson is the director of marketing for Calibre DRC applications at Mentor Graphics. John has worked extensively in the area of physical design verification for the manufacture of leading edge integrated circuits.

Protecting IP in a collaborative signoff environment

The encryption chain for today's highly collaborative designs needs to be managed with care.
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April 3, 2014
Joe Kwan is the Product Marketing Manager for Calibre LFD and Calibre DFM Services at Mentor Graphics.

Standard cell IP must pass the litho-friendly routing test

Lithography is only just beginning to play a role in cell IP selection but early analysis already matters.

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