DFM

April 3, 2014
Joe Kwan is the Product Marketing Manager for Calibre LFD and Calibre DFM Services at Mentor Graphics.

Standard cell IP must pass the litho-friendly routing test

Lithography is only just beginning to play a role in cell IP selection but early analysis already matters.
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January 20, 2014
Jean-Marie Brunet is the Product Marketing Director for DFM at Mentor Graphics

Patterning choices loom for 10nm and beyond

It is not just a choice between EUV and multiple patterning for future nodes, but even between varieties of multi-mask technologies. How will you decide?
January 13, 2014
Interconnect resistance has increased since the 40nm node

Interconnect resistance

A number of effects have led to a dramatic increase in interconnect resistance in the sub-32nm process nodes that demands the use of smarter routing.
January 13, 2014
Multiple patterning is causing issues with access to standard-cell pins in nanometer processes

Cell pin access

Increasingly complex design rules in 14nm and 16nm make it harder to connect local routing to the inputs and outputs (pins) of standard cells.
January 13, 2014
Steffen Schulze is director of marketing for Calibre Mask Data Preparation at Mentor Graphics

Consider your options for future nodes

If EUV is further delayed until 8nm, the industry has to explore other options for patterning, and the effects they will have on the DFM flow.
December 9, 2013
Carey Robertson is a director of product marketing at Mentor Graphics overseeing the marketing activities for layout versus schematic (LVS) and extraction products.

FinFET parasitics come under control

Extracting finFET parasitics means a shift to 3D models, field solvers for greater accuracy, and MCMM techniques.
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December 3, 2013
Dr David M Fried is Chief Technology Officer - Semiconductor at Coventor, responsible for the company’s strategic direction and implementation of its SEMulator3D Virtual Fabrication Platform.

Lithography challenges threaten the cost benefits of IC scaling

The costs of advanced lithography techniques at 1xnm, and the yield and reliability risks from the resultant process variation, will stop many companies getting the typical economic advantages of scaling.
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October 11, 2013
Mentor Power Grid article featured image

Power grid analysis for 2.5D and 3D IC systems

PGA has been IC-centric for mainstream 2D configurations. It must become system-centric for 2.5D and 3D systems.
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October 8, 2013
Cadence EAD flow

End mixed-signal infinite loops with electrically aware design

Electrically aware layout tools provide a more efficient alternative to time-consuming rip-up-and-retry practices in mixed-signal nanometer IC design.
October 2, 2013
tdf-ment-lde-featim

Catching layout-dependent effects on-the-fly

New layout-dependent effects (LDEs) arise at each process node. This methodology updates LDE parameters and uses on-the-fly simulation for early detection.
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