Expert Insights - EDA

Pranav Ashar  |  February 25, 2015

DO-254 without tears

Compliance with aviation’s hardware design standard is seen as a ‘tough ask’, but EDA’s own evolution has made that process easier than you may think.
Topics: EDA - Verification  |  Tags: , , , ,   |  Organizations:   |  
Marco Casale-Rossi  |  February 3, 2015

Automotive ICs drive advanced design at established nodes

Designers working on automotive ICs, to be built on established processes, can benefit from the power of design tools developed for advanced processes.
Topics: EDA - IC Implementation  |  Tags: , ,   |  Organizations:   |  
Lauro Rizzatti  |  November 6, 2014

The budget case for emulation

Need to convince your FD of emulation’s growing ROI and the need to invest? Click here and ‘Forward’
Yervant Zorian  |  October 10, 2014

Finding and fixing faults in finFET memories

FInFET memories have different defects than those based on planar transistors. Here's how to test and repair them.
Topics: IP - Assembly & Integration, EDA - DFT  |  Tags: , , , ,   |  Organizations:   |  
Pranav Ashar  |  September 30, 2014

The evolution of lint

Lint is no longer just about checking RTL code. It already incorporates functional verification within a three-stage analysis. Time to look again at a 'familiar' technology.
Topics: EDA - Verification  |  Tags: , , ,   |  Organizations:   |  
John Ferguson  |  September 10, 2014

If we’d only known then what we know now

Innovation in physical verification is driven by incoming nodes but new tools and features can and should be fed back up the technology chain.
Topics: EDA - DFM, Verification  |  Tags: , , , ,   |  Organizations:   |  
Prasad Saggurti  |  August 27, 2014

Six key criteria for deciding to migrate to a finFET process

Moving to a finFET process means considering process readiness, cost and yield, as well as the traditional power, performance and area advantages
Topics: EDA - IC Implementation, IP - Selection  |  Tags: , ,   |  Organizations: , , , , ,   |  
Joe Kwan  |  August 12, 2014

Sign-off lithography simulation and multi-patterning must play well together

Sign-off lithography verification is vital as we move beyond double to multi-patterning but changing responsibilities in the flow must be handed with care.
Hitendra Divecha  |  August 7, 2014

Dealing with parasitic-extraction challenges in finFETs and advanced nodes

FinFET and 3DIC technologies bring with them not just higher performance but an increased need for accurate parasitic analysis.
Topics: EDA - IC Implementation, Verification  |  Tags: , , ,   |  Organizations:   |  
Steve Cline  |  July 25, 2014

Using standardized design flows to cut time to tape-out – and speed design-flow evolution

Altera uses standardized design flows to help integrate Intel foundry rules, cut time to tape-out - and speed the evolution of its design flows.


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