The costs of advanced lithography techniques at 1xnm, and the yield and reliability risks from the resultant process variation, will stop many companies getting the typical economic advantages of scaling.
How the HPC company used Synopsys' Lynx Design System to standardise its flow and simplify migration to the next node.
The demands of manufacturing closure at advanced process nodes make the traditional design-then-fix flow unmanageable. At 28nm and below, designers need a solution that can address manufacturing issues at any point in the design process, enabling a true correct-by-construction methodology. An effective solution must provide design-rule-check and design-for-manufacturing analysis using the actual foundry-approved signoff rules [...]
Product engineering services can be efficiently outsourced and even the biggest players are doing it, says Michel Villemain
This year's Design Automation and Test in Europe conference heard from a broad range of users and suppliers about the challenges to and solutions for getting optimal yields at advanced process nodes, particularly as the industry advances toward 22nm. This article recaps presentations by four executives at the Dresden-hosted event: Pierre Garnier of Texas Instruments, [...]
DFM is essential to differentiating your products in the market, says Luigi Capodieci
Engineering managers need to get their priorities in order for incoming process nodes, says analyst Gary Smith
The purpose of this special issue of EDA Tech Forum is to try and cut through some of the confusion and even frustration that surrounds DFM as a concept. We cannot promise “DFM for Dummies,” but we do hope to give you a sense of how you might manage the process.
A greater proportion of the layout requires more precise extraction at the 32nm and 28nm process nodes, so rules-based extraction tools can no longer deliver the accuracy needed to confirm acceptable electrical performance. Given the nature of parasitic elements in analog and mixed-signal (AMS) system-on-chip designs, designers need a parasitic extraction tool that provides gate-level, [...]
The article provides an overview of one common theme in the papers presented at a special session of the 2009 Design Automation Conference, Dawn of the 22nm Design Era. As such, we would recommend that readers wishing to access still more detail on this topic (in particular, on device structures for 22nm and project management […]