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December 22, 2017
feat-im-in-design-DRC

Improve custom/AMS design and productivity with in-design DRC

In-design DRC is a technique that frees up engineers from many of the challenges of delivering AMS design under ever more complex design rules.
Article  |  Topics: EDA - IC Implementation, - Uncategorized  |  Tags: , , , , , ,   |  Organizations:
September 14, 2017
Featured image - Silicon photonics

Silicon photonics moves out of the shadows

An alphabet soup of AI, HPC, 5G and the IoT has finally seeded creation of a design infrastructure for silicon photonics.
October 3, 2016
Place and route beyond 10nm

How place and route is adapting to challenges below 10nm

Multi-patterning, finFETs and more are forcing more detailed overhauls of P&R software at each process node. We dig into some of the key new issues and how they are being addressed.
January 13, 2014
Multiple patterning is causing issues with access to standard-cell pins in nanometer processes

Cell pin access

Increasingly complex design rules in 14nm and 16nm make it harder to connect local routing to the inputs and outputs (pins) of standard cells.

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