How tuning a design flow can help optimize SoC processor cores for power, performance and area - and make it possible to do different optimisations for different cores on the same SoC.
In the absence of EUV lithography, the primary option for manufacturing on a 10nm process is to extend double patterning. But the options each have issues.
Better delay estimation of sub-32nm interconnects, in which resistivity varies up to 100x between layers, helps Cavium improve overall performance and get ready for even denser processes
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