22nm

March 13, 2019
Liberty Variation Format - Featured Image

Validating on-chip variation: Is your library’s LVF data correct?

Machine learning techniques help ensure the validity of Liberty Variation Format information for OCV analysis at lower process nodes.
November 24, 2017
John Ferguson is the Director of Marketing for Calibre DRC Applications at Mentor, a Siemens Business, in Wilsonville, Oregon, with extensive experience in physical design verification. He holds a BS degree in Physics from McGill University, an MS in Applied Physics from the University of Massachusetts, and a PhD in Electrical Engineering from the Oregon Graduate Institute of Science and Technology.

Assessing the true cost of node transitions

John Ferguson reviews the key capital metrics you need to review when deciding whether to move to a new process.
May 29, 2013
FinFET capacitances diagram

How to design with finFETs

How to design with finFETs, including the impact on standard cells, IP, SRAM; the effects of fin quantization; extraction and parasitics; AMS issues and more.
August 23, 2011

Parting of the ways

Intel says ‘trigate’—finFET to others—but depleted silicon-on-insulator also has its post 22nm supporters. Chris Edwards reports on the debate at 2011’s Semicon West.
Article  |  Topics: EDA - IC Implementation  |  Tags: , , , , ,   |  Organizations: ,

PLATINUM SPONSORS

Synopsys Cadence Design Systems Siemens EDA
View All Sponsors