14nm/16nm

February 11, 2014
Mark Bollar is a product marketing director at Synopsys overseeing physical implementation.

The new landscape of advanced design

Advanced tools are being applied to established nodes to produce advanced designs for volume markets.
January 13, 2014
Steffen Schulze is director of marketing for Calibre Mask Data Preparation at Mentor Graphics

Consider your options for future nodes

If EUV is further delayed until 8nm, the industry has to explore other options for patterning, and the effects they will have on the DFM flow.
December 3, 2013
Dr David M Fried is Chief Technology Officer - Semiconductor at Coventor, responsible for the company’s strategic direction and implementation of its SEMulator3D Virtual Fabrication Platform.

Lithography challenges threaten the cost benefits of IC scaling

The costs of advanced lithography techniques at 1xnm, and the yield and reliability risks from the resultant process variation, will stop many companies getting the typical economic advantages of scaling.
Expert Insight  |  Topics: EDA - DFM  |  Tags: , , , , , , , , ,   |  Organizations:
April 22, 2013
Layout segment showing problem of color splitting with double patterning

The five key challenges of sub-28nm custom and analog design

The arrival of the 20nm and finFET-based 14nm and 16nm processes bring with them challenges for custom IC design. These are the five key areas and a methodology that can address them.
December 4, 2012
Dr David M Fried is Chief Technology Officer - Semiconductor at Coventor, responsible for the company’s strategic direction and implementation of its SEMulator3D Virtual Fabrication Platform.

FinFET tipsheet for IEDM

finFETs are vital to the next generation of CMOS processes from Intel, TSMC and others. How will process issues including bulk vs SOI substrates, density limitations, thickness control, and planar device integration affect their practical implementation?
Expert Insight  |  Topics: EDA - DFM  |  Tags: , , , , , , , , ,   |  Organizations:
March 1, 2009

Rapid design flows for advanced technology pathfinding

The paper describes several innovative modifications to standard design flows that enable new device technologies to be rapidly assessed at the system level. Cell libraries from these rapid flows are employed by a design flow description language (PSYCHIC) for the exploration of highly speculative ‘what if’ scenarios. These rapid design flows are used to explore […]

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