Synopsys

September 12, 2012
tdf-sept-SNPS-crit-tools-feat

Critical tools for 20nm design

A look at the way in which key tools, in IC implementation, modeling and extraction, and physical verification, are developing in response to the challenges of 20nm design
September 6, 2012
Antun Domic

Getting ready for 20nm

Antun Domic of Synopsys tackles the three key challenges of 20nm processes: design complexity; the physics of lithography; and economics.
Expert Insight  |  Topics: EDA - DFM  |  Tags: , ,   |  Organizations:
August 23, 2011
tdf1109_accel2_large

The Universal Verification Methodology: ready, set, deploy

Mentor’s Dennis Brophy, Cadence’s Stan Krolikoski and Synopsys’ Yatin Trivedi describe how you can prepare to adopt Accellera’s Universal Verification Methodology.
Article  |  Topics: EDA - ESL  |  Tags: , ,   |  Organizations: , ,

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