Applied Materials

March 22, 2017
Computational Process Control feature

How Applied Materials and fab partners are harnessing machine learning

The equipment giant's Computational Process Control strategy takes a pragmatic approach to Industry 4.0 and is likely to influence EDA tools for incoming nodes.
March 26, 2015
10nm lithography progress

A review of model development for 10nm lithography

John Sturtevant looks at ongoing preparations for the incoming node and charts significant progress that has already been made.
Article  |  Topics: EDA - DFM  |  Tags: , ,   |  Organizations: , ,

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