Samsung Electronics

June 21, 2017

Panels see congestion and resistance dominate the leading-edge node battle

Placement-aware synthesis and an array of post-layout recovery steps have helped drive up the clock speed and silicon utilization of a series high-end SoCs on leading-edge processes developed by customers of Synopsys' implementation tools.
Article  |  Topics: Blog - EDA  |  Tags: , , , , ,   |  Organizations: , , , ,
June 18, 2017

Samsung 7nm uses EUV and split fin widths to push speeds

EUV and fin optimization help build Samsung's upcoming 7nm process, the company discloses at the VLSI Technology Symposium.
Article  |  Topics: Blog - EDA  |  Tags: , , , ,   |  Organizations:
May 12, 2017

Advanced processes feature at VLSI in June

Among the papers at this year's VLSI Symposia in Hawaii in June, Samsung will describe a 7nm CMOS process that uses EUV lithography to tighten up device features on minimum-pitch interconnects.
Article  |  Topics: Blog - EDA  |  Tags: , , , ,   |  Organizations: , ,
February 13, 2017

SPIE Advanced Lithography preview: Mentor Graphics

The major West Coast technical conference for lithography is just two weeks away and offers a packed agenda.
October 10, 2016

Speeding up AMS design in the age of finFETs

STMicroelectronics, Samsung, GSI Technology and Synopsys talk about the challenges of doing AMS design on finFET processes.
Article  |  Topics: Conferences, Design to Silicon  |  Tags: , , ,   |  Organizations: ,
August 27, 2016

Creating a reference design flow for 10nm processes: video

Synopsys video details challenges of 10nm design and its collaboration with Samsung Semiconductor to build a full flow to address them.
Article  |  Topics: Conferences, Design to Silicon, Blog - EDA  |  Tags: , ,   |  Organizations: ,
June 1, 2016

Samsung taps Mentor for Closed-Loop DFM

Samsung Foundry has adapted Mentor's DFM and test tools in a system that can produce a 10% increase in yield across all nodes.
Article  |  Topics: Blog - EDA  |  Tags: , , , , , ,   |  Organizations: ,
April 13, 2016

User2User preview: Silicon Valley edition rolls out this month

Companies presenting at User2User Santa Clara on April 26 include AMD, Microsoft, nVidia, Oracle, Qualcomm, and Samsung.
February 11, 2016

SPIE Advanced Lithography Preview: Mentor Graphics

The Calibre vendor will have a strong technical presence at the leading lithography conference taking place in late February in San Jose.
October 6, 2015

Samsung taps Mentor tools for higher yielding close-loop DFM

Samsung bases PRISM and FLARE defect analysis and optimization on Mentor Graphics' Calibre and Tessent. Yields rise. Ramps shorten.

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