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July 29, 2020

Litho hotspot analysis gets machine-learning turbocharge

A Mentor-Samsung collaboration cuts the need for model-based analysis and speeds analysis runtime by as much as 20X.
February 16, 2018

SPIE Advanced Lithography 2018 preview: Mentor

Innovation and advances in EUV and OPC lead Mentor's offerings at SPIE in San Jose later this month.
Article  |  Topics: Conferences, Design to Silicon  |  Tags: , , , , , , ,   |  Organizations: ,
February 13, 2017

SPIE Advanced Lithography preview: Mentor Graphics

The major West Coast technical conference for lithography is just two weeks away and offers a packed agenda.

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