finFET

April 22, 2015

Mentor tool streamlines multi-corner parasitic extraction

Mentor Graphics has launched Calibre xACT, a tool that uses deterministic algorithms to extract parasitics from complex finFET and other nanometer processes.
March 11, 2015

Charting out the roadmap for FD-SOI

As plans crystallize to take FD-SOI down to 10nm, CEA-Leti argues that the technology can provide an alternative path to that of finFETs to get to 7nm processes and beyond.
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March 10, 2015

Synopsys claims finFET leadership

Synopsys claims its tools have enabled 90% of finFET designs currently going into volume production
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December 18, 2014

Gary Smith EDA: PCB ‘a door to the future’ but ‘slow take-off’ for ESL

The leading EDA analyst also charts growth for RTL and IC CAD in 2014 Market Share Summary, and highlights system-driven shifts in tool evaluation.
December 16, 2014

14nm/16nm finFETs debut at IEDM

The International Electron Device Meeting (IEDM) has once again provided a chance for the major chipmakers to go head-to-head with their latest processes - this time with finFETs.
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November 24, 2014

A57 finFET design underlines routing challenges

In a presentation at the recent ARM TechCon, HiSilicon described the issues in putting together a 16nm finFET-based design built around a cluster of ARM’s Cortex A57 processors.
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November 12, 2014

TSMC begins risk production of 16FF+

TSMC says it has begun risk production on its FinFET Plus (16FF+) process, claiming that it has reached a greater level of maturity earlier in its development cycle than previous nodes developed at the foundry.
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November 12, 2014

Chip tariff eliminated and the big winner is… China?

Not just Intel and TI but also Lenovo and Huawei have cause to welcome end to 25% import tax. And could it even help reinvigorate Chinese start ups?
October 3, 2014

ARM tools take aim at finFET layout, timing issues

ARM has launched a pair of tools designed to improve the density and performance of finFET designs that use the company's physical libraries.
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October 1, 2014

Liberty changes bring together nanometer OCV techniques

The Liberty library format has been extended to cope with the most common forms of on-chip variation analysis in use today on nanometer processes.
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