5nm

December 12, 2018

IEDM shows progress on embedded eMRAM

Embedded magnetic RAM is emerging as a contender for on-chip memory not just from a density standpoint but from that of power.
Article  |  Topics: Blog - EDA, IP  |  Tags: , , , , ,   |  Organizations: , , ,
May 23, 2018

Pillar transistor points to smaller SRAMs at 5nm

Imec and Unisantis Electronics have developed a process flow based on a vertical transistor with a gate on all sides they claim will lead to denser memories on a 5nm node.
Article  |  Topics: Blog - EDA, IP  |  Tags: , , , ,   |  Organizations:
May 22, 2018

IEDM 2018 aims to span quantum, neuromorphic and CMOS devices

IEDM has issued a call for papers for its 2018 conference, expecting to cover devices and circuit interactions in neuromorphic, quantum and conventional computing.
Article  |  Topics: Blog - EDA, IP  |  Tags: , , , , , ,   |  Organizations:
April 10, 2018

Cadence tunes Virtuoso for 5nm and SIP

Cadence Design Systems has made enhancements to its Virtuoso mixed-signal layout tool at both the system-level and nanometer-design levels for its 18.1 release.
Article  |  Topics: Blog - EDA, PCB  |  Tags: , , , , ,   |  Organizations:
March 23, 2018

Layout schema generation speeds early-stage yield learning

LSG generates random design-like test vehicles to enable more detailed pre-ramp analysis for incoming nodes.
February 16, 2018

SPIE Advanced Lithography 2018 preview: Mentor

Innovation and advances in EUV and OPC lead Mentor's offerings at SPIE in San Jose later this month.
Article  |  Topics: Conferences, Design to Silicon  |  Tags: , , , , , , ,   |  Organizations: ,
May 15, 2017

IEDM opts for later deadline on 63rd conference

The 63rd IEDM has issued a call for papers for its conference in San Francisco in early December and has stuck with the later deadline introduced last year.
June 20, 2016

DTCO points to sub-10nm optimizations

DTCO work by GlobalFoundries and Qualcomm reported at VLSI Symposia shows the need to minimize fin counts in future finFET processes.
Article  |  Topics: Blog - EDA, Embedded  |  Tags: , , , , , ,   |  Organizations: ,
October 9, 2015

IMEC 5nm test chip to explore EUV and SAQP litho options

IMEC and Cadence have taped out a test chip intended to explore key lithography and metal-interconnect issues that will face users of the forthcoming 5nm process node.
Article  |  Topics: Blog - EDA  |  Tags: , , , ,   |  Organizations: ,
May 25, 2015

Shape a major choice for sub-10nm nanowire FETs

TCAD specialist GSS says nanowire transistors look practical down to 5nm but that designers need to carefully explore how the wires are shaped as quantum-confinement effects take hold
Article  |  Topics: Blog - EDA  |  Tags: , , , , , ,   |  Organizations:

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